TECHNICAL NOTES AND ARTICLES 2006 Whitepaper: Today's Semiconductor Market Demands a Strategic Metrology Partner for Agile Manufacturing Advanced Metrology Systems 07/11/2006 Download PDF Future Fab International Issue 19 - Model-based Infrared Spectroscopy New Opportunities for In-Line Process Control 07/01/2006 Download PDF Surface Wave Metrology for Copper/Low-k Interconnects M. Gostein, A.A. Maznev, A. Mazurenko, J. Tower Philips Advanced Metrology Systems 03/17/2005 Download PDF Model-Based Infrared Metrology for Advanced Technology Nodes and 300 mm Wafer Processing Peter A Rosenthal, Carlos Duran, Josh Tower, Alex Mazurenko Philips AMS, Natick, MA Ulrich Mantz, Peter Weidner, and Alexander Kasic Infineon Technologies, Dresden, Germany 03/16/2005 Download PDF AMS Licenses MKS Thin Film Tech Online Staff Electronic News 01/31/2005 Read More AMS wins important evaluation for its first metrology system and launches a second type The Semiconductor Reporter 01/28/2005 Read More AMS licenses thin-film IR metrology from MKS By Peter Clarke Silicon Strategies 01/27/2005 Read More Measuring Young's modulus of low-k dielectrics using surface acoustic waves Michael Gostein, Alex Mazurenko, and Alex A. Maznev, Philips Advanced Metrology Systems; and Michelle T. Schulberg, Novellus Systems 06/23/2004 View article "Dielectric Etch Faces Material, Process Choices" Alexander E. Braun, Senior Editor Semiconductor International 06/01/2006 View article "METROLOGY: Pressures Build on Tool Performance" By: MICRO Staff MICRO Magazine 03/01/2004 View article "Surface Waves Measure Stiffness of Low-K Materials" By Michael Gostein, Philips AMS EE Times 02/11/2004 View article "SAW Provides ECD Copper Overburden Thickness Metrology" Alexander E. Braun, Senior Editor Semiconductor International 02/01/2004 View article "Philips AMS expands applications range for low-k dielectrics" Staff Reporter Solid State Technology 12/01/2003 View article Advanced Metrology Systems Extends Relationship with European Research Center By Jerry Worchel, senior analyst InStat MDR 09/23/2003 View article AMS Eases Transition to Copper, Low-k Semicon West 2003 07/16/2003 Download PDF Future Fab International Issue 15 - Metrology Analysis Non-Destructive Detection Of Voids In Metal Interconnect Structures 07/11/2003 Read More